The 4th International Symposium for Nanomanufacturing will be hosted by MIT in Cambridge, MA, USA The ISNM was created to foster interaction between the well-established manufacturing community and the emerging nanotechnology community. Through the ISNM, scholars, engineers and members of the business community address basic research, education, dissemination, implementation and cooperation issues related to the manufacture of products that utilize the characteristics of nano-scale features/components/phenomena. The theme for 2006 will be 3D Nanomanufacturing - the realization of products that utilize nano-scale, 3D features, components, structures or assemblies to enable improved functionality. Aside from this theme, keynote lectures and sessions will also reflect classical topics, including but not limited to:

• Bridging the gap between micro- and nanomanufacturing
• Nanoparticles, molecular building blocks and thin films
• Applications (e.g. NEMS, biosensors, drug delivery devices, tissue engineering etc…)
• Directed and self-assembly
• Metrology, control and manipulation
• Equipment, instruments, and probes
• 2D/3D templating/imprinting/scaffolding
• Lithography, deposition and etching
• Optical processes (Laser, TPM, X-Ray, E-beam, etc…)
• Design, modeling and simulation tools/methods